Factors Affecting Synthesis
Concentration of HCL: Hydrochloric Acid (HCL) is used in the washing process of Graphene Oxide (GO) because HCL can remove/dissolve any metal impurity during the synthesis of GO from Hummers method. By using concentrated HCL partial reduction of GO may be possible.
Centrifuge Time and Speed: Centrifuge time and speed (rpm) decide the amount of GO settle down in the centrifuge tube. At higher speed and more time washing, even smaller size GO can settle down in the centrifuge tube.
Number of Washing: How many times you wash is very important in this washing process. More times you wash the GO, leads to good quality GO with less impurities.